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Semiconductor Cleaning Technology Processing

2019-09-04

The semiconductor cleaning process mainly removes particles and metal contamination on the silicon wafer, organic matter, resist de-glue in etching and wiring processes, removal of compounds, and cleaning after CMP.

Production age technology node / pitch / nm wafer diameter / mm particle diameter / nm particle quantity / table


With the continuous improvement of the manufacturing process of semiconductor devices, the global 90nm process has been ushered in! 300mm wafer production era. in! Driven by the technology of 300mm wafers and 90nm copper technology, the global semiconductor equipment market in 2004 increased by 67.1% compared with 2003, reaching 37.08 billion US dollars. Among them, the semiconductor cleaning equipment market increased by 61.2% compared with 2003, reaching 1.673 billion US dollars. The market share of the monolithic cleaning equipment market is rapidly increasing, and it is expected to reach 40% of the entire wet cleaning equipment market by 2008, reaching US$630 million.



Guangdong Giant Fluorine Energy Saving Technology Co.,Ltd
Business Type:Distributor/Wholesaler , Manufacturer , Trade Company , Agent
Product Range:Other Chemicals , Organic Intermediate , Other Chemicals
Products/Service:Fluorocarbon Refrigerant , Fluoride solution , Hydrofluoroether , UV printer ink , AF-coating , Anti-Fingerprint Original Solution
Certificate:MSDS
Company Address:Room 401 Building 2 No. 51 Bihu Dadao Fenggang Zhen Dongguan City GUangdong, Shenzhen, Guangdong, China

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